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Advancing technology is one more important
way that Praxair Electronics provides value for
our semiconductor customers.
By staying at the forefront of gas and materials technologies,
Praxair Electronics helps semiconductor manufacturers and OEMs
to improve equipment productivity and implement advanced production
technologies. We are building on our strong process materials
competencies and experience in gases production, purification
and analytical technology, combined with our outstanding materials
science capability in metallurgy and ceramics.
Here are a few of the areas of innovation that
Praxair Electronics is currently pursuing:
- Organometallic thin-film
deposition materials: ALD precursor development for high-k
dielectrics, barriers, and metal gate; synthesis and purification
of Hf, Ru, Ta, Si, and Pt, among other materials
- Sputtering targets:
proprietary metallurgy for
improved uniformity, consistency and unique
designs for low cost of ownership
- New alternatives for CMP pads
and slurries
- UpTime package: Praxair’s patented dopant
gas delivery system
- Process gases: next-generation hydride
gas
purities for epitaxial processing including SiGe
and compound semiconductor films
- Next-generation cleaning technologies:
supercritical
CO2 for advanced wafer processing
- Surface coatings: improved
chamber productivity
with yttria and other advanced coatings
R&D platforms
for material science and gas technology
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